濃度分析系統

WetSpec - Wet Chemistry Process monitoring system

Features and Benefits



    In-line, real-time monitoring and characterization of chemical composition of liquids No need for chemical sampling or dilution Short measurement time and low operational costs One analyzer can monitor several measuring cells with different chemistries Analysis of complex (multi-component) chemistries Real-time measurement enables closed loop control Up to 200 meters distance between analyzer and measuring cell enables placement of analyzer in a convenient location
    With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring. When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield.


適用於半導體濕製程(Wet Bench)即時監測(In-line monitoring),可隨時掌握化學液狀況,如清洗(Clean),蝕刻(Etch),去光阻(Strip)等Processes,如半導體的SC1SC2BOEDHFEKCACT; TFT-LCDAl etchBOEPR STRIPPER;與太陽能的HF/HNO3KOH/IPA.提供您對化學液用量、製程效率、製程問題改善、化學液壽命延長控制、研發幫助,同時能偵測8種不同成分的化學槽